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0010-03485 Magnet AssyversusMVP 015 Vacuum

Applied Materials 0010-03485 Magnet Assy, Pfeiffer MVP 015 Vacuum, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsPfeiffer
Category——
Wafer size——
Process node——
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Production run——
Lifecycle——
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Control system——
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FamilyApplied Materials 0010-03485 Magnet AssyPfeiffer MVP
Cited variants—
Specifications
ConfigurationWP AL 300mm PVD[2]—
OEMApplied Materials[2]—
Model0010-03485[2]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]—
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]—
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Pumping Speed—15 L/min[6]
Mass—5.5 kg[6]
Power Consumption—0.04 kW[6]
Voltage—100 V, 50 Hz[6]
Type designation—MVP 015-2[1]
Supply voltage—100 V, 50 Hz; 110 V, 60 Hz[6]
Input voltage—100 – 115 / 208 – 236 V[1]
Rated current consumption—1.1 A[1]
Rotation speed at 50 Hz—1500 rpm[1]
Rotation speed at 60 Hz—1800 rpm[1]
Final pressure without gas ballast—3.5 hPa[1]
Intake pressure max.—1100 hPa[1]
Exhaust pressure max.—1100 hPa[1]
Ambient temperature—5 – 40 °C[1]
Protection degree—IP20, Type 1[1]
Cooling method—Forced convection[1]
Weight—6.5 kg[1]
Sources (6)Every fact above is drawn from these public sources
  1. [1]pfeiffervacuum.compfeiffervacuum.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com
  6. [6]inventory listing