Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Nikon NWL 851 Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | NWL 851 WaferNikon |
|---|---|---|
| OEM | Applied Materials | Nikon |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Nikon NWL 851 Wafer |
| Specifications | ||
| Make | Applied Materials[1] | Nikon[3] |
| Model | 0010-22161[1] | NWL 851[3] |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Objective lens | — | CF Plan 5 × BD NA0.135 / 10 × BD NA 0.30 / 50 × BD NA 0.80[3] |
| Eyepiece | — | CFIUW 10 /25 × 2 (magnification 10 ×, field of view 25 mm)[3] |
| Tube | — | 3 erect images, with C-mount adapter[3] |
| Observation method | — | reflected bright field/reflected dark field[3] |
| Revolver | — | ACP 21 with motorized switching controller (5 holes)[3] |
| Stage | — | Large 8-inch compatible stage, lower right handle (clutch-free mechanism), X-Y stroke 205 mm, 8-inch rotating holder[3] |
| Illumination device | — | LA 150 UX (halogen lamp 150 W[3] |
| Type | — | Wafer Loader[3] |