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Comparison ledger

0010-22161 High EFF RF MatchversusCW 2000 Compact

Applied Materials 0010-22161 High EFF RF Match, SCREEN CW 2000 Compact, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsSCREEN
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchSCREEN CW 2000
Specifications
MakeApplied Materials[1]SCREEN / DNS[3]
Model0010-22161[1]CW 2000[3]
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Station 1—Loader[3]
Station 2—ACT 930 (Solvent for Etch Residue and Positive Photoresist)[3]
Station 3—Quick Dump Risse (QDR)[3]
Station 4—IPA[3]
Station 5—Quick Dump Rinse (QDR)[3]
Station 6—Drain IPA Substitution (DIS)[3]
Equipment type—Wet Station[3]
Wafer sizes—2, 4, 5, 6, 8 inch[3]
Vintage—2018[4]
Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]inventory listing
  4. [4]Equipment inventory listing