Waferpedia

Comparison ledger

0041-39086 ESC PartversusUnaxis 790 RIE

Applied Materials 0041-39086 ESC Part, Plasma-Therm Unaxis 790 RIE, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
Unaxis 790 RIEPlasma-Therm
OEMApplied MaterialsPlasma-Therm
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Plasma-Therm Unaxis 790
Specifications
Configuration—Gases:[1]
Wafer size—6 inch[1]
Process gases—SF6, CHF3, CF4, O2, He, Ar, N2[1]
RF source frequency—13.56 MHz[1]
Tool type—Reactive Ion Etcher (RIE)[1]

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Sources (1)Every fact above is drawn from these public sources
  1. [1]inventory listing