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Comparison ledger

E 500 EHPI Medium CurrentversusViision 80

Applied Materials E 500 EHPI Medium Current, Varian Viision 80, side by side. Every value shown is drawn from the cited encyclopedia entries.

Documented as functional equivalents— Same function class: Ion Implantation, null[1]
Side-by-side comparison of selected equipment models
Attribute
E 500 EHPI Medium CurrentApplied Materials
OEMApplied MaterialsVarian
CategoryIon ImplantationIon Implantation
Wafer sizeWafer Position Detect—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials E 500Varian Viision 80
Specifications
Loading ConfigurationOpen Cassette[2]—
SoftwareV 13.30 rev D[3]—
Floppy Drive Type3.5"[3]—
ConfigurationCE Mark[3]Medium Current[4]
Energy Range10 KeV - 200 KeV[2]—
Solid State Scanner30 KV[3]—
Gas Box TypeHP[2]—
Computer TypePentium[3]—
OEMApplied Materials / Varian[3]—
ModelE 500 EHPI[2]Viision 80[4]
CategoryIon Implantation[2]Ion Implantation[4]
Wafer Sizes6 inch[3]8 inch[4]
Load Lock TurboV 300 HT[3]—
Source Zone Turbo PumpSTP 1000[3]—
Scanner Turbo PumpSTP 1000[3]—
Analyzer Turbo PumpV 300 HT[3]—
Vacuum Pumps (3)Edwards QDP 80, QMB 250[3]—
Pump TypeDry[3]—
Wafer sizeWafer Position Detect[3]—
Wafer size / detectWafer Position Detect[2]—
ScannerSolid State Scanner, 30 KV[3]—
Control interfaceGEM/SECS; SECS II Interface[3]—
Voltage—208 V[4]
Phase—3 Phase[4]
Power—45 kW[4]
Make—Varian[4]
Electrical—208 V, 3 Phase, 5 Wire[4]
Vintage—2000[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing
  4. [4]inventory listing