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Comparison ledger

E 500 HPversusEHPI E 220

Applied Materials E 500 HP, Varian EHPI E 220, side by side. Every value shown is drawn from the cited encyclopedia entries.

Documented as functional equivalents— Same function class: Ion Implantation, null[1]
Side-by-side comparison of selected equipment models
Attribute
E 500 HPApplied Materials
OEMApplied MaterialsVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials E 500Varian EHPI E 220
Specifications
ConfigurationMedium Current[1]Medium Current[2]
Wafer Size8 inch[1]—
Current TypeMedium Current[1]—
SMIF Interface—Varian Interface for Brooks SMIFS[2]
Line Voltage—3 Phase, 208 V[2]
Line Frequency—50 / 60 Hz[2]
UPS—CVCS[2]
Gas Box—4 Sticks, HP and SDS 2 in use[2]
HE MFC Size—Optional[2]
Type—Cryopump on board 4 f[2]
Cassette Stage—200 mm (8") Standard[2]
Wafer Mapping—Optical Sensor[2]
Lamp Colors—Red, Orange, Green[2]
Chiller—Heat Exchange[2]
DI Cart—EHPI with B-Pure Filters[2]
Make—Varian[2]
Model—EHPI E 220[2]
Category—Ion Implantation[3]
Wafer Sizes—8 inch[2]
System description—8-inch, medium-current system with a SMIF interface[3]
Vacuum—Cryopump on board 4 f[3]
Gas delivery—4 Sticks, HP and SDS 2 in use[3]
Chambers—2[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com