Comparison ledger
Applied Materials PI 9500 Ion, Axcelis 200 PCU, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | PI 9500 IonApplied Materials | 200 PCUAxcelis |
|---|---|---|
| OEM | Applied Materials | Axcelis |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | Wafer Loader Blade Control PCB | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2000 Vintage |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials PI 9500 | Axcelis NV GSD 200 |
| Cited variants | — | |
| Specifications | ||
| Configuration | Belt Drive[3] | — |
| Frequency | 60 Hz[3] | 50 Hz[4] |
| Utilities | Top feed[3] | — |
| Water fittings | Imperial[3] | — |
| Remote distance | 6m umbilical[3] | — |
| Layout | Thru wall[3] | — |
| Wafer cassette | 26 wafers[3] | — |
| Helium line length | 15 m[3] | — |
| Factory interface | SECS / GEM[3] | — |
| Tilt angle | Variable 0-7 degree[3] | — |
| Plasma Flood System | HDPFS[3] | — |
| Beamline | Standard[3] | — |
| Source type | Bernas[3] | — |
| Front plate | Tungsten[3] | — |
| Extraction type | Single bellows[3] | — |
| Make | Applied Materials[3] | — |
| Model | PI 9500[3] | — |
| Equipment type | Ion Implanter[3] | — |
| Wafer Sizes | 6 inch[3] | — |
| Drive | Belt Drive[3] | — |
| Pumps | Leybold Turbo pumps; Ebara A07V Mech pump; CTI Cryo pump[3] | — |
| Standard wheel | 25 wfr wheel[3] | — |
| Source chamber liners | Included[3] | — |
| MRS Chamber Liners | Included[3] | — |
| Gas position 1 | Boron (gas module missing)[3] | — |
| Gas position 2 | n/a (gas module missing)[3] | — |
| Gas position 3 | Phosphine[3] | — |
| Gas position 4 | Arsine[3] | — |
| Wafer size | Wafer Loader Blade Control PCB[3] | — |
| P/N | — | SC 4840 A[4] |
| Phase | — | 3 Phase[4] |
| Voltage | — | 400 V[4] |
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