Waferpedia

Comparison ledger

LinDAversusHVM3

ASM LinDA, MRSI HVM3, side by side. Every value shown is drawn from the cited encyclopedia entries.

Documented as functional equivalents— Same function class: Packaging & Bonding, null[1]
Side-by-side comparison of selected equipment models
Attribute
HVM3MRSI
OEMASMMRSI
CategoryPackaging & BondingPackaging & Bonding
Wafer size——
Process node——
Introduced——
Production run—2018–
Lifecycle——
Lifecycle milestones—2019 Name change
Control system——
Generation——
FamilyASM LinDAMRSI HVM3
Cited variants
Specifications
Voltage200 VAC, Single Phase[5]—
Configuration50/60 Hz[5]—
Vintage (manufacture year)2012[5]—
Machine typeDie bonder[1]—
CategoryPackaging & Bonding[1]—
Power200 VAC, single phase, 50/60 Hz[5]—
Vintage2012[5]—
Application—Microwave modules, hybrid, optical modules, epoxy and eutectic die bonding[6]
Placement accuracy—3 microns, 3 sigma, true radial placement (depending on application)[6]
Placement repeatability—≤ 1 micron[6]
XY motors—Brushless DC linear motors with glass-scale encoder resolution of 50 nm[6]
X travel—17.5 in (444.5 mm)[6]
Y travel—36.0 in (914.4 mm)[6]
Z travel—1.5 in (38.1 mm)[6]
Theta travel—360°[6]
Theta resolution—0.0045°[6]
Pressure control—10 g to 5 kg per placement[6]
Cameras—2 down-looking cameras sharing an optical path; 1 up-looking camera[6]
Vision system—Edge detection and pattern recognition[6]
Lighting—Red, green, and blue; ring or coaxial illumination; programmable intensity[6]
Pickup nozzles—13 in standard nozzle changer; multiple changers optional; can also carry epoxy dispensing heads[6]
Waffle packs—Up to 72 2 x 2 in waffle packs (50.8 x 50.8 mm) or Gel-Paks™ or 4 x 4 in (101.6 x 101.6 mm)[6]
Tape and reel feeders—Up to ten 8 mm tape and reel feeders[6]
Eutectic bonding—Programmable ramp rate; maximum temperature 450°C[6]
Process gases—Nitrogen, argon, N2-H2, or Ar-H2[6]
Dispense pumps—2 syringe rotary screw pumps or time/pressure-controlled pumps[6]
Dispense height sensing—3-point laser height mapping of the substrate plane[6]
Dispense needle cleaning—Automated programmable cleaning between pattern dispense intervals[6]
Dispense needle calibration—Automatic software calibration using beam sensor[6]
Repeatability—≤ 1 µm[6]
Minimum chip size—0.008 sq. inch (200 sq. micron)[6]
Illumination—RGB; ring or coaxial; intensity programmable[6]
Eutectic temperature—up to 450ºC[6]
Minimum placement force (closed loop)—10 g[6]
Maximum placement force (closed loop)—5 kg[6]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]dynamicmos.comdynamicmos.com
  3. [3]web.archive.orgweb.archive.org
  4. [4]mycronic.commycronic.com
  5. [5]inventory listing
  6. [6]web.archive.orgweb.archive.org