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Comparison ledger

GSD HE High Energyversus160 XP Ion

Axcelis GSD HE High Energy, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMAxcelisVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis GSD HE High EnergyVarian 160 XP Ion
Specifications
Wafer Size8 inch[1]—
Manufacturing Year2000[2]—
Configuration—150mm High Current IMP[3]
OEM—Varian[4]
Model—160 XP Ion[4]
Category—Ion Implantation[3]
Tool type—ion implanter[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]limitekltd.comlimitekltd.com
  3. [3]waferpedia.comwaferpedia.com
  4. [4]Equipment inventory listing