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017-0146-01 PrealignerversusMPA 600 Super Mirror Projection Mask

Brooks 017-0146-01 Prealigner, Canon MPA 600 Super Mirror Projection Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMBrooksCanon
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBrooks 017-0146-01 PrealignerCanon MPA 600 Super Mirror Projection Mask
Specifications
Manufacturer—Canon[1]
Model—MPA 600 Super[1]
Tool type—Super Mirror Projection Mask Aligner[1]
Application—mass production of VLSI devices[2]
Wafer sizes available—6", 5", and 4"[2]
Mask sizes available—7", 6", and 5"[2]
Illumination—2KW High Pressure Mercury Lamp[2]
Intensity—> 600mW / cm2 (6 inch wafer)[2]
Illumination uniformity—+ 3%[2]
Aperture sizes—0.7, 0.6, 0.5[2]
Exposure uniformity—+ 3%[2]
Resolution—1.5um[2]
Depth of focus—> + 6um (linewidth 1.5um)[2]
Magnification—< 0.2um (PDC ON)[2]
Distortion—3sigma < 0.5um (PDC OFF)[2]
Scanning accuracy—< + 1.5%[2]
Auto alignment accuracy—LBS AA 3sigma < 0.58um (HeNe laser beam scan); TV AA 3sigma < 0.43um (TV image processing)[2]
Throughput (6 inch wafer)—> 89 wfs/h (first mask mode); > 77 wfs/h (LBS AA mode); > 68 wfs/h (TVAA mode)[2]
Auto feeder—Single or double, cassette to cassette, backside wafer handling[2]
Required facilities—200 VAC, 3Phase, 6 kVA, 50/60Hz; Air Supply(CTC): 200 VAC, 3Phase, 8 kVA, 50/60Hz; CDA(Clean Dry Air)Pressure: minimum 6.5 kg/cm2, flow rate 130 lit/min; Vacum: 50 cmHg or more; Exhaust Flow(for illuminator): 6.5 m/sec to 9.5 m/sec (measured at illuminator output)[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]servtechinc.comservtechinc.com