Comparison ledger
CEE 100 Spin, SVG 86, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100 SpinCEE | 86SVG |
|---|---|---|
| OEM | CEE | SVG |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | SVG 86 |
| Specifications | ||
| Configuration | Volts 115[1] | — |
| Track 1 | — | Sender - Coat - Receiver[2] |
| Track 2 | — | Sender - Developer - Receiver[2] |
| Type | — | Coater/Developer[2] |
| Wafer size range | — | 2" to 200mm[3] |
| Wafer shape | — | Round and square[3] |
| Robotic wafer handling | — | Yes[3] |
| Control | — | PC-based graphical user programming, touch screen control[3] |
| Recipe management software | — | Nettrack[3] |
| Barcode input | — | Optional[3] |
| Track configuration | — | Track 1: Sender - Coat - Receiver; Track 2: Sender - Developer - Receiver[2] |
Plan your fab
Building a Resist Processing process? Get a complete equipment list.
Open the fab equipment planner →