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100 SpinversusAct 8

CEE 100 Spin, Tokyo Electron Act 8, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
100 SpinCEE
Act 8Tokyo Electron
OEMCEETokyo Electron
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 100Tokyo Electron Act
Cited variants—
  • Act 8 Coater / Developer - Dual Block, 4 Load Port/1 Side Port - 4 Coaters - 3 Developers - 1 TCT - 14 PHP Hot Plates[1]
  • Act 8 Coater / Developer, 8" - Single[2]
  • Act 8 Coater / Developer, 8"[3]
  • Tel Act 8 Coater / Developer, 8" - Single[2]
  • Tel Act 8 Coater / Developer - Dual Block, 4 Load Port/1 Side Port - 4 Coaters - 3 Developers - 1 TCT - 14 PHP Hot Plates[1]
  • Tel Act 8 Coater / Developer, 8"[3]
Specifications
ConfigurationVolts 115[4]Dual Block, 4 Load Port/1 Side Port[1]
Vintage—2006
Coaters & Developers Vintage—1999
Wafer Size—8 inch[7]
100 Spin entryAct 8 entryAsk about these tools →Share experience with this comparison →

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Sources (7)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]inventory listing
  5. [5]inventory listing
  6. [6]inventory listing
  7. [7]Equipment inventory listing