Waferpedia

Comparison ledger

1000 Hot Plateversus6112

CEE 1000 Hot Plate, YES 6112, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
6112YES
OEMCEEYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size—8 in. wafers
Process node——
Introduced—2000
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 1000 Hot PlateYES 6112
Specifications
Configuration4"[1]—
TypeHot Plate[1]—
Wafer Size4 inch[1]—
Capacity—4 cassettes of 8 in. wafers[2]
Cleanliness—< 10 x 0.5 - micron particles per 8-in. wafer[2]
Throughput—2 full loads/hr.[2]
HMDS usage—<7 ml/200 wafers (>50 prime cycles/pint)[2]
Temperature—160°C max[2]
Outer system—stainless steel[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org