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Comparison ledger

300 Bake Plateversus450 PB 12 Polyimide

CEE 300 Bake Plate, YES 450 PB 12 Polyimide, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMCEEYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size300mm300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 300 Bake PlateYES 450
Cited variants
  • Apogee Benchtop 300 Bake Plate[1]
  • Apogee Flange Mount 300 Bake Plate[1]
  • Apogee X-Pro 300 Bake Plate[1]
—
Specifications
Wafer sizeup to 300mm wafer[2]Capacity is two 25 wafer cassettes in a batch process (50 wafers at a time) - 300mm FOUP[4]
SoftwareInternal OS[2]—
Voltage208V[2]208V, 3 Phase 50/60 Hz, 40 amps[4]
Max Substrate Size300mm round or 12" x 12" square[1]—
Min Substrate Size4 inch round[1]—
Max Temperature300°C (400°C optional)[1]—
Temperature Resolution0.1°C[1]—
Temperature Uniformity±0.3% across working area[1]—
Smart Pin Height Range0-19 mm[1]—
Weight (machine only)146 lb (66.2 kg)[3]—
Dimensions18" H x 18.75" W x 26.25" D[3]—
Power3100-4100 watts[3]—
Exhaust Port2" (50.8mm) OD[3]—
Chamber Material—316L Stainless Steel[4]
Operation Temperature—ambient to 450°C (option high temp version: Ambient to 550°()[4]
Process Gas Inputs—1 standard up to 3 optional[4]
Configuration—Preheated N, (Process Gas)[4]
Mass Flow Controllers—optional, up to 3[4]
Laminar Flow Filter—100 micron Mott'" plate filter[4]
Cleanliness—particle reduction in most applications[4]
OEM—YES[4]
Model—450 PB 12[4]
Category—Thermal / Diffusion[5]
Capacity—Two 25-wafer cassettes in a batch process (50 wafers at a time)[4]
FOUP compatibility—300mm FOUP[4]
Wafer handling—Uses wafer cassette; wafers are manually brought to the machine and loaded inside[4]
Operation temperature—Ambient to 450°C[4]
Gas delivery—1 standard up to 3 optional[5]
Process gas—Preheated N2[4]
Vacuum—Alternate vacuum valve for process vacuum[5]
Vacuum plumbing—VCR[5]
Number of Recipes—8 temperature profiles (up to 200 with YES - DAQ-LR option)[4]
Temperature—Ambient to 450°C with LED temperature and set point displays[4]
Oxygen Concentration—10 ppm over background[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]costeffectiveequipment.comcosteffectiveequipment.com
  2. [2]inventory listing
  3. [3]sistemtechnology.comsistemtechnology.com
  4. [4]inventory listing
  5. [5]waferpedia.comwaferpedia.com