Comparison ledger
Nikon 1505 G 6 E, Nikon SF 200, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | SF 200Nikon |
|---|---|---|
| OEM | Nikon | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | Nikon SF 200 |
| Specifications | ||
| Configuration | 5" reticle[1] | PPD[4] |
| Resolution | 650 nm[2] | 0.18um[4] |
| Numerical Aperture | 0.54[2] | — |
| Reduction | 5x[2] | — |
| Exposure Field | 15 x 15 mm[2] | — |
| Alignment Accuracy | 130 nm[2] | — |
| Wafer Size | 4 inch[1] | — |
| Light Source | g-line[3] | — |
| Introduction Year | 1988[2] | — |
| NA (Numerical Aperture) | 0.54[2] | — |
| Make | Nikon[1] | — |
| Model | 1505 G 6 E[1] | — |
| Category | Stepper[1] | — |
| Wafer Sizes | 4 inch[1] | — |
| Exposure type | g-line[2] | — |
| NA | 0.54[2] | — |
| Exposure field | 9.3 x 18.8 mm[2] | — |
| Laser | — | Komatsu[4] |
| Wafer loader type | — | type 3, NC Pre2[4] |
| Reticle size | — | 6"[4] |
| Max expose field size | — | 26mm x 33mm[4] |
| Reticle library | — | Nikon standard (9 slot)[4] |
| Alignment system | — | LSA, FIA[4] |
| Inline | — | Left in'line[4] |
| Chamber type | — | S61[4] |
| Wafer sizes | — | 8 inch[4] |
| PPD | — | Yes[4] |
| Bar code reader | — | Yes[4] |
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