Comparison ledger
Plasma-Therm SLR 770 RIE, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SLR 770 RIEPlasma-Therm | 1512eTegal |
|---|---|---|
| OEM | Plasma-Therm | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Plasma-Therm SLR 770 | Tegal 1512e |
| Specifications | ||
| Voltage | 208 V[1] | — |
| Frequency | 60 Hz[1] | — |
| Configuration | RF power supply has a water leak[1] | — |
| Process capabilities per chamber | RIE or PE adjustable[2] | — |
| Top electrode gap | Adjustable[2] | — |
| Pumping | TMP turbo pumps[2] | — |
| Gas lines per chamber | 8 gas lines and MFCs[2] | — |
| Maximum wafer size | up to 8 inch wafers[3] | — |
| Electrical | 208 V - 60 Hz[1] | — |
| Vintage | 1994 Vintage[1] | — |
| Tool type | — | Industrial RIE plasma etcher system[4] |
| Stated configuration | — | With modules assembly for CI-4222[4] |
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