Waferpedia

Comparison ledger

150 e MaskversusMA 150 CC Mask

SUSS MicroTec 150 e Mask, SUSS MicroTec MA 150 CC Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
150 e MaskSUSS MicroTec
MA 150 CC MaskSUSS MicroTec
OEMSUSS MicroTecSUSS MicroTec
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySUSS MicroTec 150 e MaskSUSS MicroTec MA 150
Specifications
Configuration—Topside Alignment[1]
Max Wafer Size—6"/150mm Wafer Capable[1]
Make—SUSS[1]
Model—MA 150 CC[1]
Tool type—Mask Aligner[1]
Wafer sizes—2, 3, 4, 5, 6 inch[1]
Topside alignment—Supported[1]
Operation mode—Automatic or manual mode[1]
Alignment—Automatic alignment[1]
Prealigner—Optical prealigner[1]
Lamp house—1000 Watt lamphouse[1]
Optics—UV400 optics for 365nm and 405nm exposure[1]
Front lens—UV400 front lens[1]
Lamp power supply—Suss CIC 1000 Lamp Power Supply[1]
Microscope—Suss DVM 6 Microscope[1]
Camera—CCD camera right and left[1]
Contact exposure modes—Hard, soft, and vacuum contact exposure modes[1]
Display—Flat panel touchscreen[1]
Documentation—Operations manual[1]

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Sources (1)Every fact above is drawn from these public sources
  1. [1]inventory listing