Comparison ledger
SUSS MicroTec 150 e Mask, SUSS MicroTec MA 200, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | MA 200SUSS MicroTec |
|---|---|---|
| OEM | SUSS MicroTec | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec 150 e Mask | SUSS MicroTec MA 200 |
| Specifications | ||
| Voltage | — | 230 V[1] |
| Configuration | — | 3200 VA[1] |
| Frequency | — | 50 Hz[1] |
| Manufacturer | — | SUSS[1] |
| Model | — | MA 200[1] |
| Category | — | Aligner[2] |
| Wafer sizes | — | 6 inch[1] |
| Referenced in process guidance | — | AZ P4000 Series exposure-dose guidance lists Suss MA-200 and gives approximate dose values of 1.5 μm = 90 mJ/cm2, 3.5 μm = 135 mJ/cm2, and 12 μm = 800 mJ/cm2[3] |
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