Comparison ledger
SUSS MicroTec 150 e Mask, Ultratech Titan 4700, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | Titan 4700Ultratech |
|---|---|---|
| OEM | SUSS MicroTec | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec 150 e Mask | Ultratech Titan 4700 |
| Specifications | ||
| Optics | — | G and H line[1] |
| Lamp Power | — | 1000 W[1] |
| Extended Focus Option | — | Yes (for thick resist exposure)[1] |
| Wafer Sizes Supported | — | 4 inch, 5 inch, 6 inch, 8 inch[1] |
| Reticle Size | — | 5 inch (upgradable to 6 inch)[1] |
| Maximum Field of View | — | 44 mm x 26.7 mm[1] |
| Numerical Aperture | — | 0.32[1] |
| Robot | — | Genmark[1] |
| Machine Vision System | — | Cognex[1] |
| Reticle Bar Code Reader | — | Yes[1] |
| Auto Aperture | — | For 2 or 3 field reticles[2] |
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