Comparison ledger
SUSS MicroTec 260 MS 022 Lithography Exposure, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 260 MS 022 Lithography ExposureSUSS MicroTec | 1000 FamilyUltratech |
|---|---|---|
| OEM | SUSS MicroTec | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec 260 MS 022 Lithography Exposure | Ultratech 1000 Family |
| Specifications | ||
| Wafer size | 6 inch[1] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[2] |
| Optical design | — | Wynne Dyson[2] |
| Magnification | — | 1X[2] |
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