Comparison ledger
SUSS MicroTec MA 200 Compact Mask, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MA 200 Compact MaskSUSS MicroTec | 1000 FamilyUltratech |
|---|---|---|
| OEM | SUSS MicroTec | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | Wafer Handler | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec MA 200 | Ultratech 1000 Family |
| Specifications | ||
| Phase | 3 Phase +N +PE[1] | — |
| Configuration | 50/60 Hz[1] | — |
| Voltage | 400V[1] | — |
| Wafer size | Wafer Handler[1] | — |
| Handler Type | Robot[1] | — |
| Gas | N2[1] | — |
| Power | 400V[1] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[2] |
| Optical design | — | Wynne Dyson[2] |
| Magnification | — | 1X[2] |
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