SUSS MicroTec MA 6 Mask

Models in this family

1. 

   MA 6 BA 6 Gen 2 Mask

   The SUSS MA 6 / BA 6 Gen 2 Mask Aligner is a lithography mask aligner with topside and backside alignment, a 150 mm chuck, and UV400 splitfield optics for 365 nm and 405 nm exposure.

2. 

   MA 6 BA 6 Mask

   The SUSS MA 6 / BA 6 Mask Aligner is a lithography mask aligner line with source-stated variants for top-side alignment, back-side alignment, and optical BSA configurations.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   MA 6 / BA 6 TSA (Top-Side Alignment), BSA (Back-Side Alignment)	—	2001	Listed with TSA and BSA.	Equipment inventory listing[1]
   MA 6 / BA 6 Optical BSA	—	2000	Listed with optical BSA, DVM6 microscope, upgraded Gen2 CIC power supply, 350W lamphouse, 50/60 Hz, 230 V, and 1500 VA.	Equipment inventory listing[2]
   MA 6 / BA 6	—	—	—	Equipment inventory listing[3]

3. 

   MA 6 Mask

   The SUSS MA 6 Mask Aligner is a semiconductor lithography tool used for mask alignment and exposure, supporting various wafer sizes and featuring infrared alignment and a split-field microscope.

Sources