Ulvac NE 950

Models in this family

1. NE 950

   The Ulvac NE 950 is an ICP-RIE etch system with a chamber described for 2" to 12" wafers.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   NE 950 EX ICP	—	—	—	waferpedia.com[1]
   NE 950 ICP-RIE	—	—	—	waferpedia.com[1]

2. 

   NE 950 EX ICP

   The Ulvac NE 950 EX ICP is an inductively coupled plasma etcher.

3. 

   NE 950 ICP-RIE

   The Ulvac NE 950 is an ICP-RIE (Inductively Coupled Plasma - Reactive Ion Etch) system with a chamber described for 2" to 12" wafers.

Sources