Applied Materials
80 XR Leap II Ion
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
General reference — not yet source-verifiedAn ion implanter generates a beam of dopant ions, accelerates it to a controlled energy, and scans it across the wafer surface to achieve a uniform implanted dose.
The ion beam is mass-analyzed to select only the desired ion species before acceleration.
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is a core doping step in semiconductor fabrication, used after photolithography and before annealing.
The process follows pattern definition and precedes a thermal anneal step that activates the implanted dopants and repairs crystal damage.
Applications
General reference — not yet source-verifiedIon implanters are used to introduce dopant impurities into silicon wafers to form p-type or n-type regions.
Common applications include the formation of source and drain regions, well implants, channel-stop implants, and threshold-voltage adjustments in CMOS devices.
What do the numbers mean?
Wafer handling1
Vintage & configurations
- 2002Manufacture year[1]
2002 vintage
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the 80 XR Leap II Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the 80 XR Leap II Ion are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented variants, configuration options, or revision breakpoints of the 80 XR Leap II Ion are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 80 XR Leap II Ion are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 80 XR Leap II Ion are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 80 XR Leap II Ion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
Last updated Oct 4, 2026.
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