Applied Materials
Centura 5200
Power
RF Plasma[2]
Vacuum
Ebara A 10 W Buffer Chamber Pump[2]
Gas delivery
2 populated out of 4 available[1]
What it is
The Centura 5200 is manufactured by Applied Materials. The system supports wafers of 8 inch (200 mm) diameter. The platform can be configured with a 5200 WxZ CVD process chamber for dielectric film deposition. The Centura 5200 is also available in a PECVD variant that uses RF plasma for chamber cleaning and enhanced deposition.[1][2][5]
How it works
In the PECVD configuration, the Centura 5200 employs a WxZ process chamber type. The chamber uses RF plasma to enhance the chemical reaction during deposition and also for in-situ chamber cleaning (RF plasma clean). Backside pressure control is provided by an MKS 1170 argon flow controller at 2 SLM. The system includes an enhanced cooled lid assembly and a heater of type AL with ceramic purge ring. Process gases are delivered via a Seriplex gas panel.[2]
The system is equipped with a four-color light tower for status indication. The loadlock is of narrow-body type with auto-tiltout capability. The buffer robot is a single-blade HP+ variant. Vacuum pumping is provided by Ebara pumps: an A10W for the buffer chamber, A70W backing pumps for chambers A and B, and an A10W for the loadlock backing pump.[2]
What do the numbers mean?
Power & electrical1
Vacuum & pumping7
Wafer handling3
Gas & chemistry2
Configuration & options7
Vintage & configurations
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Gas boxes2 populated out of 4 available[1]
- Gas Panel TypeSeriplex[2]
- ConfigurationEbara A 10 W Buffer Chamber Pump[2]
- ConfigurationEbara A 70 W WXZ Backing Pump[2]
- ConfigurationEbara A 10 W Loadlocks Backing Pump[2]
- Chamber Clean ProcessRF Plasma[2]
- Backside Pressure ControlMKS 1170 Argon 2SLM[2]
- Buffer chamber pumpEbara A 10 W[2]
- Backing pump (Chamber A & B)Ebara A 70 W WXZ[2]
- Loadlocks backing pumpEbara A 10 W[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer size does the Centura 5200 support?
The Centura 5200 supports 8 inch (200 mm) wafers.[2]
What types of deposition does the Centura 5200 perform?
The Centura 5200 performs chemical vapor deposition (CVD) and plasma-enhanced chemical vapor deposition (PECVD).[2][5]
What process chamber type is used in the Centura 5200?
The system uses a 5200 WxZ CVD process chamber.[1]
Not publicly documented
The following facts about the Centura 5200 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura 5200 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Centura 5200 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura 5200 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura 5200 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Centura 5200 are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Inventory photo
- [4]Inventory photo
- [5]Equipment inventory listing
Last updated Sep 30, 2026.
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