Waferpedia

Applied Materials

Centura HP

DepositionApplied Materials Centura family
Research Quality: 50% complete

Applied Materials Centura HP is a physical vapor deposition (PVD) system. Applied Materials Centura HP supports 8-inch wafers. Applied Materials Centura HP includes two PVD chambers, one clean chamber, one cool chamber, and one flat chamber.[1]

Centura HP — Inventory photo
Fig. 01Centura HPInventory photo[1]

What it is

The Applied Materials Centura HP is a physical vapor deposition (PVD) system designed for 200 mm (8-inch) wafers.[1]

How it works

General reference — not yet source-verified

In a PVD system, a target material is bombarded with energetic ions in a vacuum chamber, causing atoms to be ejected and deposited onto the wafer surface.

The Centura platform uses a cluster tool architecture where wafers move between chambers under vacuum without exposure to atmosphere, enabling sequential processing steps.

Where it fits in the process flow

General reference — not yet source-verified

PVD is typically employed in the metallization stages of semiconductor manufacturing, after dielectric planarization and before photoresist patterning.

The deposited films serve as conductive layers or barriers that form part of the interconnect structure on the wafer.

Applications

General reference — not yet source-verified

Applications include the deposition of aluminum, titanium, titanium nitride, tantalum, and tantalum nitride films for interconnects, contact plugs, and diffusion barriers.

What do the numbers mean?

Wafer handling1

Wafer Size
8 inch[1]
Accurate?

Configuration & options6

2 PVD chambers[1]
Accurate?
1 Clean Chamber[1]
Accurate?
1 Cool Chamber[1]
Accurate?
1 Flat Chamber[1]
Accurate?
Technology
Physical Vapor Deposition (PVD)[1]
Accurate?
Chamber Configuration
2 PVD chambers, 1 Clean Chamber, 1 Cool Chamber, 1 Flat Chamber[1]
Accurate?
Interested in this tool?
Need help with this tool?Embed spec card

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

What type of deposition does the Centura HP perform?

The Centura HP performs physical vapor deposition (PVD).[1]

How many PVD chambers does the system have?

The Centura HP has two PVD chambers.[1]

Not publicly documented

The following facts about the Centura HP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura HP are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Centura HP are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Centura HP are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Centura HP are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Centura HP is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]Inventory photo
Was this page accurate?

Last updated Sep 22, 2026.

Compare with similar tools

View all →