Applied Materials
P 5000 Mark II DLH
The Applied Materials P 5000 Mark II DLH is a plasma-enhanced chemical vapor deposition (PECVD) system. The Applied Materials P 5000 Mark II DLH processes 6-inch wafers. The Applied Materials P 5000 Mark II DLH can be configured for silane DCVD or PECVD-TEOS deposition.[1][2]
Power
RF Match Type Phase IV[1]
Vacuum
Edwards iH600 (3 required)[1]
Gas delivery
Gas Panel Type 28 line[1]
What it is
The Applied Materials P 5000 Mark II DLH is a plasma-enhanced chemical vapor deposition system.[2]
How it works
Where it fits in the process flow
General reference — not yet source-verifiedThe P 5000 Mark II DLH sits in the deposition portion of the wafer manufacturing flow.
The system is used after prior wafer preparation steps and before later patterning or etch steps that rely on the deposited film.
Applications
What do the numbers mean?
Power & electrical4
Vacuum & pumping2
Wafer handling5
Gas & chemistry5
Control & software3
- Mini-Controller[1]
Configuration & options29
- Silane[1]
- Bolt-Down Lid[1]
- Storage Elevator 8 Slots[1]
- Expanded (21 Slot) VME[1]
- Floppy Drive Type 3 ½[1]
- CVD Chamber Items[1]
- Lid Type Boltdown[1]
- Endpoint Standard[1]
- Cathode Type Susceptor[1]
- Remote Frame w/AC Box[1]
- Chamber Lid Type Details[1]
- Chamber Position AMAT[1]
- Position A[1]
- Position B[1]
- Chamber Configuration
- Position A: Silane DCVD, Position B: Silane DCVD, Position C: Silane DCVD, Position D: Empty[1]
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| P 5000 Mark II DLH Delta | — | — | — | waferpedia.com[2] |
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Lam Research Concept One 200 PECVD-TEOS— Same function class: Deposition, nullCompare in depthsource[3]
- Oxford Instruments Plasmalab 800 Plus— Same function class: Deposition, nullCompare in depthsource[4]
- Orient Service S 1861 14— Same function class: Deposition, nullCompare in depthsource[5]
- Lam Research Gasonics Vector SOLA— Same function class: Deposition, nullCompare in depthsource[6]
- Lam Research Gasonics Vector Express— Same function class: Deposition, nullCompare in depthsource[7]
- Lam Research Concept One 150— Same function class: Deposition, nullCompare in depthsource[8]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ConfigurationGas Panel Type 28 line[1]
- ConfigurationRF Match Type Phase IV[1]
- ConfigurationLid Gas Distribution GDP[1]
- ConfigurationRF Generator Rack[1]
- ProcessPlasma-Enhanced Chemical Vapor Deposition (PECVD)[1]
- Gas PanelType 28 line[1]
- RF Match TypePhase IV[1]
- Lid Gas DistributionGDP[1]
- RF Generator RackPresent[1]
- Roughing PumpsEdwards iH600 (3 required)[1]
- Load Lock PumpEdwards iH80 series[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the P 5000 Mark II DLH are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the P 5000 Mark II DLH are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the P 5000 Mark II DLH are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the P 5000 Mark II DLH are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the P 5000 Mark II DLH is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the P 5000 Mark II DLH are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (8)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Equipment inventory listing
- [4]nanocenter.umd.edunanocenter.umd.edu
- [5]Equipment inventory listing
- [6]Equipment inventory listing
- [7]Equipment inventory listing
- [8]Equipment inventory listing
Last updated Oct 3, 2026.
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The Lam / Novellus Concept One 150 is a plasma-enhanced chemical vapor deposition (PECVD) system for 6-inch wafers.
The Lam / Novellus Concept One 200 PECVD-TEOS is a plasma-enhanced chemical vapor deposition tool for tetraethyl orthosilicate processing.
The Lam / Novellus / Gasonics Vector Express is a PECVD system stated to be configured for 12-inch wafers.
The Lam / Novellus / Gasonics Vector SOLA is a plasma-enhanced chemical vapor deposition (PECVD) system that processes 12-inch wafers and includes a UV cure capability.
