ASML
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The ASML PAS 5500/350C is a DUV stepper used in photolithography. The PAS 5500/350C is typically configured as part of a lithography cluster with a TEL Clean Track ACT-8 coater/developer for processing 100 mm wafers. The PAS 5500/350C was manufactured in 1997 and includes a Cymer ELS 5600 excimer laser.[1][2]

The ASML 5500 350 C operates with a coater and developer track in line with the stepper to form a lithography cluster for wafer processing.[1]
The ASML PAS 5500 family is used for integrated-circuit patterning in semiconductor manufacturing.[3]
Documented failure modes, common issues, and field considerations.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| PAS 5500/350C | — | — | — | epfl.ch[1] |
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The model designation is ASML 5500 / 350 C.[2]
The following facts about the 5500 350 C are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 5500 350 C are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 5500 350 C are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the 5500 350 C is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 5500 350 C are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the 5500 350 C are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Last updated Oct 4, 2026.
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