ASML
The ASML 850 B KrF Scanner is a lithography scanner. The ASML 850 B KrF Scanner has model designation 850 B. The ASML 850 B KrF Scanner includes a Cymer ELS-600.[1]

The ASML 850 B is a KrF scanner used for photolithography in semiconductor manufacturing.[1]
A KrF scanner exposes a photosensitive layer on a wafer through a patterned reticle using deep ultraviolet light from a krypton fluoride excimer source.
A scanner in lithography aligns the wafer and reticle, projects the pattern in a controlled optical path, and steps the exposure field across the substrate during pattern transfer.
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The following facts about the 850 B KrF are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 850 B KrF are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 850 B KrF are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 850 B KrF are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 850 B KrF are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 850 B KrF is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 5, 2026.
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