Axcelis
NV 8200 P
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
General reference — not yet source-verifiedIon implantation is a process used in semiconductor manufacturing to introduce dopant atoms into a silicon wafer. An ion implanter accelerates a beam of ionized dopant species to a controlled energy and directs it at the wafer surface. The depth of penetration is determined by the acceleration energy, and the dose is controlled by the beam current and exposure time.
Applications
General reference — not yet source-verifiedCommon applications include forming P-type and N-type wells, source/drain extensions, and deep source/drain regions. The medium current capability allows for precise dose control in applications that require moderate doping concentrations.
What do the numbers mean?
Wafer handling1
Configuration & options3
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the NV 8200 P are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NV 8200 P are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NV 8200 P are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NV 8200 P are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NV 8200 P are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NV 8200 P is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]waferpedia.comwaferpedia.com
- [2]Equipment inventory listing
- [3]surplus.infineon.com — surplus.infineon.comsurplus.infineon.com
Last updated Sep 24, 2026.
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