Waferpedia

Hitachi

9300

Hitachi 9300 family
Research Quality: 40% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Hitachi 9300 is a semiconductor manufacturing equipment model designation used by Hitachi. The Hitachi S-9300 is a high-resolution critical dimension scanning electron microscope for semiconductor wafer metrology. The Hitachi S-9300 can load 200 mm wafers or 300 mm wafers.[1][2]

Hitachi logo
Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

Power

500V to 1600V, 10V steps[2]

Performance

3 sigma 5nm without auto-focus[2]

Optics

1000X to greater than 300,000X[2]

What it is

The Hitachi 9300 is a semiconductor manufacturing equipment model designation used by Hitachi.[3][1]

The designation refers to the Hitachi S-9300, a high-resolution critical dimension scanning electron microscope (CD-SEM) for semiconductor wafer metrology.[2][5]

How it works

The system uses a Schottky emission electron source, an accelerating voltage range of 500V to 1600V, and a three-stage electromagnetic lens system with boosting voltage.[2]

The S-9300 provides magnification from 1000X to greater than 300,000X and achieves a resolution of 3nm at 800V.[2]

The tool includes a SECS/GEM communication interface, dual XY stages, Hitachi microscale DSP image processing, and backscattered electron (BSE) mode functionality.[2]

Static measurement accuracy is 3 sigma 5nm without auto-focus, and the tool demonstrates loading reliability with 25 load operations without error on both ports A and B.[2]

Throughput is 28 wafers per hour, and auto-addressing accuracy is within plus or minus 3.0 micrometers in both x and y directions.[2]

Applications

Applications of the Hitachi S-9300 include critical dimension measurement for process control, edge roughness evaluation, multipoint measurement, and imaging of wafer surfaces at high magnification.[2]

What do the numbers mean?

Power & electrical3

Accelerating voltage
500V to 1600V, 10V steps[2]2 sources
Accurate?
Lens system
3-stage electromagnetic lens system with boosting voltage[2]2 sources
Accurate?
Resolution
3nm at 800V[2]2 sources
Accurate?

Vacuum & pumping1

Objective aperture
4-opening, click-stop, heated aperture is selectable/adjustable outside the vacuum[2]
Accurate?

Wafer handling4

Application
Semiconductor wafer metrology[1]
Accurate?
Throughput
28 wafers per hour[2]2 sources
Accurate?
Wafer size
200 mm or 300 mm[2]2 sources
Accurate?
Field of view / wafer imaging ability
Entire surface of 12 inch wafer[2]
Accurate?

Optics & imaging2

Tool type
High-resolution critical dimension scanning electron microscope (CD-SEM)[1]
Accurate?
Magnification
1000X to greater than 300,000X[2]2 sources
Accurate?

Performance2

Static measurement accuracy
3 sigma 5nm without auto-focus[2]2 sources
Accurate?
Auto-addressing accuracy
Within ±3.0 µm in both x and y directions[2]2 sources
Accurate?

Control & software1

Communication interface
SECS/GEM[2]2 sources
Accurate?

Configuration & options12

Manufacturer
Hitachi[1]
Accurate?
Model
9300[3]
Accurate?
Research status
Provisional entry; no specifications recorded yet[1]
Accurate?
Designation
Hitachi S-9300[1]
Accurate?
Electron source
Schottky emission source[2]2 sources
Accurate?
Stage configuration
Dual XY stages[2]2 sources
Accurate?
Image processing
Hitachi microscale DSP image processing[2]2 sources
Accurate?
Imaging mode
Backscattered electron (BSE) mode functionality[2]2 sources
Accurate?
Loading reliability
25 load operations without error on both ports A and B[2]2 sources
Accurate?
Field of view
1.2mm[2]
Accurate?
Probe current
4~24pA[2]
Accurate?
Scan coil
2-stage electromagnetic deflection[2]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Accelerating voltage500V to 1600V, 10V steps[2]
  • Lens system3-stage electromagnetic lens system with boosting voltage[2]
  • Resolution3nm at 800V[2]
  • Objective aperture4-opening, click-stop, heated aperture is selectable/adjustable outside the vacuum[2]

Parts & consumables

Tracked replaceable assemblies, spares criticality, and availability status across all major subsystems. Each entry cites its source.

  • Hitachi SFT 9300 XRF Coating Thickness Gauge (X-ray Fluorescence)In Productionsource[4]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What type of tool is the Hitachi 9300?

The Hitachi 9300 is a semiconductor manufacturing equipment model designation used by Hitachi. The Hitachi S-9300 is a high-resolution critical dimension scanning electron microscope for semiconductor wafer metrology.[1]

What wafer sizes can the Hitachi S-9300 handle?

The Hitachi S-9300 can load 200 mm wafers or 300 mm wafers.[1][2]

What electron source does the Hitachi S-9300 use?

The Hitachi S-9300 uses a Schottky emission electron source.[1][2]

What measurements and inspection tasks does the Hitachi S-9300 support?

The Hitachi S-9300 supports critical dimension measurement, edge roughness evaluation, multipoint measurement, and imaging of wafer surfaces at high magnification.[1]

Not publicly documented

The following facts about the 9300 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 9300 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 9300 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 9300 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 9300 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 9300 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (5)Every fact above is drawn from these public sources
  1. [1]waferpedia.com — waferpedia.comwaferpedia.com
  2. [2]fabsurplus.com — fabsurplus.comfabsurplus.com
  3. [3]Equipment inventory listing
  4. [4]Equipment inventory listing
  5. [5]https://tw.limitekltd.com/resources/uploads/pdf/(HT025)%20Hitachi%20S-9300.pdf — tw.limitekltd.comtw.limitekltd.com
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Last updated Oct 7, 2026.

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