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Karl Suss

MJB-3

Lithography3"Karl Suss MJB-3 family
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The MJB-3 is a Karl Suss mask aligner. The MJB-3 is a contact/proximity aligner. The MJB-3 can be set to utilize either 365 nm or 405 nm light.[1][2]

Karl SussMJB-3
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  • Plate 01Suss MJB3 350W Mask Aligner (ID 3885)

    ClassOneEngineeringWatch on YouTube
  • Plate 02Karl Suss MJB-3 HP/ST Inv# 59511

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  • Plate 03Karl Suss MJB3 Mask Aligner #60007

    Bid ServicellcWatch on YouTube
  • Plate 04Suss MJB3 350W BSA IR Mask Aligner (ID# 3845)

    ClassOneEngineeringWatch on YouTube
  • Plate 05MNTL Karl Suss MJB3 Aligner training

    cleanroom MNTLWatch on YouTube
  • Plate 06Karl Suss MJB3 UV Intensity Measurement and Verification Supplement

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  • Plate 07Karl Suss MJB3 Mask Aligner #59510

    Bid ServicellcWatch on YouTube
  • Plate 08Karl Suss MJB3 Aligner #60414

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Wafer size

3"

Optics

365 nm or 405 nm[1]

What it is

The Karl Suss MJB-3 is a mask aligner used for lithography on substrates up to three inches in diameter. The MJB-3 is used on smaller samples as well.[1][2]

The MJB-3 is a contact or proximity aligner. The MJB-3 is used in a teaching cleanroom environment for contact photolithography.[2][3]

How it works

The MJB-3 can be set to use either three hundred sixty-five nanometers or four hundred five nanometers of light. The MJB-3 is used with both positive and negative photoresists.[1][2]

Where it fits in the process flow

The MJB-3 is used after photoresist is applied to the substrate. The MJB-3 supports standard photoresist processing in a teaching cleanroom workflow.[2][3]

Applications

The MJB-3 is used with a variety of positive and negative photoresists. The MJB-3 supports lithographic pattern transfer for small substrates and sample pieces.[1][2]

  • Mask alignment
  • Photolithography

What do the numbers mean?

Wafer handling1

Maximum substrate diameter
up to 3"[1]
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Gas & chemistry1

Photoresist compatibility
a variety of both positive and negative photoresists[1]
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Optics & imaging2

Illumination wavelengths
365 nm or 405 nm[1]
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Light options
365 nm or 405 nm light[1]
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Configuration & options6

OEM
Karl Suss[1]
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Model
MJB-3[1]
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Type
Contact/proximity aligner[1]
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Resists
Used with a variety of both positive and negative photoresists[1]
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Location
FabLab | Teaching Lab[1]
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Sample compatibility
works for smaller samples[1]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Photoresist compatibilitya variety of both positive and negative photoresists[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What substrate size does the MJB-3 accept?

The MJB-3 is used with substrates up to three inches in diameter. The MJB-3 also works with smaller samples.[1][2]

What alignment mode does the MJB-3 use?

The MJB-3 is a contact or proximity aligner.[1][2]

What photoresists can be used with the MJB-3?

The MJB-3 is used with a variety of positive and negative photoresists.[1][2]

Not publicly documented

The following facts about the MJB-3 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MJB-3 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the MJB-3 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the MJB-3 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the MJB-3 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the MJB-3 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]nanocenter.umd.edu — nanocenter.umd.edunanocenter.umd.edu
  2. [2]PHOTO-03: MJB-3 Mask aligner- right of spin station #1 | Equipment | Maryland NanoCenter FabLab — nanocenter.umd.edunanocenter.umd.edu
  3. [3]ECE Teaching Cleanroom | Electrical and Computer Engineering | UC Santa Barbara — ece.ucsb.eduece.ucsb.edu
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Last updated Oct 3, 2026.

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