KLA
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The eV 300 provides automatic defect classification (ADC) to sort defects by type in real time. The tool supports tilt and rotation of the wafer for multi-angle imaging, voltage contrast review for electrical defect detection, and high aspect ratio interconnect (HARI) imaging for deep structures. Landing energy can be set up to 19 keV, enabling unambiguous material identification. The system integrates with KLA-Tencor's Klarity Defect data management platform for further analysis and excursion monitoring.[2]
The eV 300 is suited for both in-line monitoring and engineering analysis at 0.13 micron and smaller technology nodes. Specific capabilities include voltage contrast review for electrical defect detection, high aspect ratio interconnect (HARI) imaging for deep vias and trenches, and elemental analysis via EDX when equipped.[2][3]
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The eV 300 supports landing energy up to 19 keV.[2]
The eV 300 can be configured to handle 150 mm, 200 mm, or 300 mm wafers.[2]
The eV 300 is intended for 0.13 micron and smaller design rules.[2]
The eV 300 delivers a four-fold increase in productivity compared to manual SEM review systems.[2]
The following facts about the eV 300 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the eV 300 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the eV 300 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the eV 300 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the eV 300 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the eV 300 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 24, 2026.
The KLA .204 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 particle counters.
KLA .496 PSL Wafer is an 8-inch NIST traceable wafer stated to be capable on Surfscan 6xy0 and SP1.
The KLA .498 PSL Wafer is a NIST traceable reference wafer.