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Lam Research

2300 V 2 Kiyo 45

EtchLam Research 2300 family
Research Quality: 50% complete

The Lam 2300 V 2 Kiyo 45 is a semiconductor etcher from Lam Research. The Lam 2300 V 2 Kiyo 45 is configured for polysilicon etching with a 4ch (four-channel) setup. The Lam 2300 V 2 Kiyo 45 supports process gases including SiCl4, BCl3, HBr, CH4, CHF3, Cl2, CH2F2, CH3F, NF3, O2, CF4, He, Ar, and N2.[1]

2300 V 2 Kiyo 45 — Inventory photo
Fig. 012300 V 2 Kiyo 45Inventory photo[2]

Power

2300 V 2 Kiyo 45[2]

Vacuum

Edwards STP XA2703CV[1]

What it is

The Lam Research 2300 V 2 Kiyo 45 is an etcher produced by Lam Research.[2][6][1][4][5]

How it works

General reference — not yet source-verified

Plasma etching reactors generate a plasma from process gases using radio-frequency power. The ionized species chemically react with exposed wafer materials while ions provide directional bombardment, enabling anisotropic etching.

The Kiyo family of etchers typically employ inductively coupled plasma (ICP) sources to achieve high plasma density at low pressures. Process chambers are clustered around a central wafer-handling robot.

Where it fits in the process flow

General reference — not yet source-verified

In a semiconductor fab, plasma etching is used after photolithography to transfer the pattern into the underlying layer. The etched wafer then proceeds to resist stripping and subsequent processing steps.

Applications

General reference — not yet source-verified

Plasma etching is applied to a variety of materials including polysilicon, silicon dioxide, and silicon nitride during the fabrication of transistors and interconnect structures.

What do the numbers mean?

Power & electrical1

Model
2300 V 2 Kiyo 45[2]
Accurate?

Vacuum & pumping2

Vacuum pump
Edwards STP XA2703CV[1]
Accurate?
Pump
Edwards STP XA2703CV[1]
Accurate?

Gas & chemistry3

Process gases
SiCl4, BCl3, HBr, CH4, CHF3, Cl2, CH2F2, CH3F, NF3, O2, CF4, He, Ar, N2[1]
Accurate?
Gas Chemistry
SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2[1]
Accurate?
Supported Gases
SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2[1]
Accurate?

Configuration & options15

Polysilicon[1]
Accurate?
4ch[1]
Accurate?
SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2[1]
Accurate?
Edwards STP XA2703CV[1]
Accurate?
Process capability
Polysilicon[1]
Accurate?
Chamber configuration
4ch (4-channel)[1]
Accurate?
Make
Lam[2]
Accurate?
Category
Etcher[2]
Accurate?
Process
Polysilicon etching[1]
Accurate?
Number of Chambers
4ch[1]
Accurate?
Number of chambers
4[1]
Accurate?
Process chambers
4[1]
Accurate?
Process Type
Polysilicon[1]
Accurate?
Chamber Count
4[1]
Accurate?
Vintage (some units)
2007, 2008, 2009[4]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
Lam 2300 V 2 Kiyo 45 Etcher - Polysilicon - 4ch - SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2 - Edwards STP XA2703CV 2008 Vintage—2008Listed with polysilicon, 4ch, the gas set, Edwards STP XA2703CV, and 2008 vintage.Equipment inventory listing[1]
Lam 2300 V 2 Kiyo 45 Etcher - Polysilicon - 4ch - SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2 - Edwards STP XA2703CV 2007 Vintage—2007Listed with polysilicon, 4ch, the gas set, Edwards STP XA2703CV, and 2007 vintage.Equipment inventory listing[4]
Lam 2300 V 2 Kiyo 45 Etcher - Polysilicon - 4ch - SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2 - Edwards STP XA2703CV 2009 Vintage—2009Listed with polysilicon, 4ch, the gas set, Edwards STP XA2703CV, and 2009 vintage.Equipment inventory listing[5]
Lam 2300 V 2 Kiyo 45 Etcher—2007–2007Listed with an Edwards STP XA2703CV pump and described as 2007 vintage.Equipment inventory listing[4]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Process gasesSiCl4, BCl3, HBr, CH4, CHF3, Cl2, CH2F2, CH3F, NF3, O2, CF4, He, Ar, N2[1]
  • Vacuum pumpEdwards STP XA2703CV[1]
  • Model2300 V 2 Kiyo 45[2]
  • Gas ChemistrySiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2[1]
  • PumpEdwards STP XA2703CV[1]
  • Supported GasesSiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What material is the Lam 2300 V 2 Kiyo 45 primarily used to etch?

The system is used for polysilicon etching.[1][4][5]

Not publicly documented

The following facts about the 2300 V 2 Kiyo 45 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 2300 V 2 Kiyo 45 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the 2300 V 2 Kiyo 45 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 2300 V 2 Kiyo 45 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 2300 V 2 Kiyo 45 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the 2300 V 2 Kiyo 45 are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (7)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Inventory photo
  3. [3]Inventory photo
  4. [4]Equipment inventory listing
  5. [5]Equipment inventory listing
  6. [6]Equipment inventory listing
  7. [7]Equipment inventory listing
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Last updated Oct 11, 2026.

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