Lam Research

Plate 01Lam Research Lam Rainbow 4400 4500 4600 4420 4520 4620 4720 plasma etcher semiconductor equipment
1994 vintage
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Rainbow 4420 Plasma Etcher, 8" | — | 1994 | 8-inch wafer size; Envision 1.5 software; CIM SECS; process CMOS; Harmonics Arm (2); SMIF (2); LL Pump; TCU 2080; AC Rack; PC Pump; 208 volts. | Equipment inventory listing[1] |
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
No research found yet — worked with this tool? Share what you know.
The following facts about the Rainbow 4420 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the Rainbow 4420 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Rainbow 4420 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Rainbow 4420 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Rainbow 4420 are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Last updated Sep 24, 2026.
The Nordson March AP 1000 is a plasma system used for etching, operating at 50 Hz with a CB current of 25 A and an SCCR of 10 kA.
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
The Applied Materials 0010-16392 is an electrostatic chuck assembly designed for 300 mm wafer processing, featuring a dual electrode configuration.