Waferpedia

LEO

1550

Metrology & Inspection4"LEO 1550 family
Research Quality: 30% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

LEO1550
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How it works

The LEO 1550 can support electron-beam imaging in a metrology workflow that includes image analysis and automated measurement of critical dimensions from saved SEM images through external software.[2]

Applications

The LEO 1550 can be used with saved SEM images for automated critical-dimension measurement and batch analysis of image sets.[2]

  • SEM imaging

What do the numbers mean?

Wafer handling1

Sample holders
4 Inch Wafer, 6 Inch Wafer, 6 Inch Mask[1]
Accurate?

Configuration & options1

Section
FIB / SEM / EDX / ProSEM[1]
Accurate?
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Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What kind of measurements can be made from SEM images in this workflow?

ProSEM can make automated feature size measurements from saved SEM images.[2]

What does ProSEM do in the metrology workflow?

ProSEM is a software package for SEM image analysis and measurements.[2]

Does ProSEM support batch processing?

ProSEM can batch process images for measurement consistency across multiple images.[2]

Not publicly documented

The following facts about the 1550 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • Fewer than 3 independently cited specifications for the 1550 are on record; the remainder await public documentation.

    Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 1550 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 1550 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 1550 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 1550 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]epfl.ch — epfl.chepfl.ch
  2. [2]ProSEM software ‒ Center of MicroNanoTechnology CMi ‐ EPFL — epfl.chepfl.ch
  3. [3]EDX ‒ Center of MicroNanoTechnology CMi ‐ EPFL — epfl.chepfl.ch
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Last updated Oct 10, 2026.

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