SCREEN
WS 620 C
What it is
General reference — not yet source-verifiedThe SCREEN WS 620 C is a wet bench for wet processing and clean applications.
How it works
General reference — not yet source-verifiedA wet bench processes wafers through liquid chemical baths and rinsing and drying steps.
Where it fits in the process flow
General reference — not yet source-verifiedA wet bench sits in the wafer-cleaning portion of the fab flow and supports removal of contaminants, native oxides, and process residues before later fabrication steps.
The SCREEN WS 620 C supports wet cleaning and drying sequences that can be used between etch, deposition, oxidation, and lithography-related steps when surface condition must be reset.
Applications
General reference — not yet source-verifiedThe SCREEN WS 620 C is used for wet cleaning and surface preparation on wafers in a clean processing environment.
What do the numbers mean?
Wafer handling1
Configuration & options18
- Convertible to 8"[1]
- Tank configuration:[1]
- Caro (SPM)[1]
- H/C QDR[1]
- dHF[1]
- EDR[1]
- hotPhos[1]
- SC1[1]
- QDR[1]
- SC2[1]
- FR[1]
- IPA Vapor Dryer[1]
- Tank configuration
- Caro (SPM), H/C QDR, dHF, EDR, hotPhos, H/C QDR, SC1, QDR, SC2, H/C QDR, FR, IPA Vapor Dryer[1]
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Lam Research SEZ SP 304— Same function class: Wet Processing / Clean, UnknownCompare in depthsource[3]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the WS 620 C are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the WS 620 C are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the WS 620 C are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the WS 620 C are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the WS 620 C are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the WS 620 C is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Equipment inventory listing
- [4]Lam Research SEZ SP 304 vs SCREEN WS 620 C comparison | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 9, 2026.
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