WS 820 L Single Wafer

The SCREEN WS 820 L is a wet station designed for batch cleaning of semiconductor wafers. The system processes 200 mm (8 inch) wafers and uses carrierless transfer processing, meaning wafers are moved without conventional wafer carriers.^[1][2]

The WS 820 L is part of the SCREEN WS-620C/WS-820C/WS-820L series of high-throughput batch cleaning systems. The system supports flexible configuration with up to thirteen processing baths and can accommodate up to six transfer robots to maintain high throughput.^[1]

The WS 820 L operates as a batch wet station where wafers are sequentially processed through a series of chemical and rinse baths. Multiple processing baths can be installed, and up to six transfer robots move wafers between baths to ensure high throughput.^[1]

The system uses carrierless transfer, which eliminates the need for wafer carriers during transport between baths. A low-pressure drying unit can be mounted to reduce watermarks and ensure clean drying; this drying option is available only for the WS 820 L model.^[1]

The system's high throughput and multiple bath capability make it suitable for high-volume manufacturing environments where consistent, repeatable cleaning is required. Typical placement includes post-ash residue removal, pre-diffusion cleaning, and pre-thin-film deposition surface preparation.