SPTS
CPX Pegasus
What it is
How it works
The CPX Pegasus is a deep reactive ion etcher that uses inductively coupled plasma.[9]
The CPX Pegasus uses a source RF generator rated at 6.5 kW and a platen RF generator operating at 13.56 MHz.[1][9]
The CPX Pegasus includes a Brooks MagnaTran 7 robot for wafer transport.[1][9][3]
The CPX Pegasus uses an electrostatic chuck and heating and cooling circuits with house water, deionized water, and silicon oil for temperature control.[9]
Where it fits in the process flow
General reference — not yet source-verifiedAn etch tool transfers a patterned film image into an underlying layer after patterning has defined the areas to be removed.
The CPX Pegasus belongs in dry plasma processing for material removal on patterned wafers.
Applications
What do the numbers mean?
Power & electrical10
Vacuum & pumping10
Wafer handling5
- Brooks MagnaTran 7 robot[1]
Gas & chemistry2
Control & software1
Configuration & options29
- 2 Chambers[1]
- The Transport Module’s components:[1]
- Transport Module Chamber[1]
- Cooling and Heating Systems:[1]
- Four heating/cooling systems:[1]
- House Water[1]
- Insert Heaters[1]
- Cooling/Heating Systems
- House Water, DI Water chiller (SMC HRZ-L2-DY), Silicon oil chiller (SMC HRZL-D), Insert Heaters[1]
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Nordson March AP 300— Same function class: Etch, nullCompare in depthsource[4]
- Oxford Instruments Plasmalab 100 ICP 380— Same function class: Etch, nullCompare in depthsource[5]
- Nordson March AP 1000— Same function class: Etch, nullCompare in depthsource[6]
- Lam Research Alliance A 6 Exelan HP Dielectric— Same function class: Etch, nullCompare in depthsource[7]
- Tegal 90 X— Same function class: Etch, nullCompare in depthsource[8]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Configuration380 Volts[1]
- Configuration160 Amps[1]
- ConfigurationRF Generator Units:[1]
- Source RF GeneratorMKS 6.5 kw RF Power Generator[1]
- Platen RF GeneratorMKS/ENI ACG 3B 13.56MHz RF Generator[1]
- ConfigurationPumping System:[1]
- Rotary Pump3 PCS[1]
- Turbo pump2 PCS[1]
- ConfigurationPressure System:[1]
- Voltage380 Volts[1]
- Voltage (alternate)400 Volts[2]
- Current160 Amps[1]
- RF Source GeneratorMKS 6.5 kW RF Power Generator[1]
- RF Platen GeneratorMKS/ENI ACG 3B 13.56MHz RF Generator[1]
- Rotary Pump Quantity3 PCS[1]
- Turbo Pump Quantity2 PCS[1]
- Pressure System ComponentsMKS Baratron gauge (10-4~10-1 m Torr), MKS 750 capacitance (10-760 Torr), BOC EDWARDS Active gauge (10-4mTorr~10Torr), ESC (ceramic)[1]
- Gases SupportedSF6, C4F8, O2, N2, Ar[1]
- Gas Flow RatesC4F8 400 sccm, SF6 1200 sccm, Ar 500 sccm, O2 200 sccm[1]
- Pump TypeEDWARDS[2]
- Cluster Transfer PumpALCATEL[2]
- Dry Pumps1-DS80, 2-DS700[3]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the CPX Pegasus are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the CPX Pegasus are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the CPX Pegasus are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the CPX Pegasus are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the CPX Pegasus are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the CPX Pegasus is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (11)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]semistarcorp.com — semistarcorp.comsemistarcorp.com
- [3]macquarie.com — macquarie.commacquarie.com
- [4]waferpedia.comwaferpedia.com
- [5]Equipment inventory listing
- [6]Equipment inventory listing
- [7]Equipment inventory listing
- [8]web.archive.orgweb.archive.org
- [9]CPX Pegasus — SPTS | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
- [10]SPTS, STS CPX Pegasus — wotol.comwotol.com
- [11]CPX Pegasus Polysilicon — SPTS | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 8, 2026.
Compare with similar tools
View all →General referenceThe Tegal 90 X is an etch system designed for semiconductor fabrication, representing a class of dry plasma etching equipment used to remove material from wafer surfaces with high precision.
Lam Alliance A 6 Exelan HP Dielectric is an etch tool with an 8-inch wafer size.
The Nordson March AP 1000 is a plasma system used for etching, operating at 50 Hz with a CB current of 25 A and an SCCR of 10 kA.
The Nordson March AP 300 is a plasma system with a 300 Watt, 13.56 MHz RF generator and an integrated RF automated tuning network assembly.
