Waferpedia

SUSS MicroTec

ACS 200 Linear Wafer Tracks

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

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Gas delivery

Resist coater/developer[2]

Optics

125 mm x 125 mm; 150 mm x 150 mm[4]

What it is

The SUSS MicroTec ACS 200 Linear Wafer Tracks are wafer-track systems used as resist coater and developer equipment.[5][2]

The ACS 200 Gen3 is an automated coater and developer platform for wafers from one hundred millimetres to two hundred millimetres.[3]

How it works

The ACS200 uses cassette-to-cassette substrate handling, spin coating, spray coating, hotplate baking, automated edge-bead removal, and backside rinse.[4]

The ACS200 includes separate coating and development stations, and the system can process coating and development flows in parallel under operator control.[6]

Applications

The ACS200 Gen3 is used for research and high-volume manufacturing.[3]

The ACS200 supports photoresist coating for optical pattern exposure and photoresist coating for mask production.[4]

What do the numbers mean?

Wafer handling5

Wafer size
6 inch[2]
Accurate?
Supported wafer range
100 mm to 200 mm wafers[3]
Accurate?
Supported substrate diameter
Maximum wafer diameter: 200 mm (8 in)[4]
Accurate?
Supported wafer diameters
50 mm, 75 mm, 100 mm, 150 mm, 200 mm[4]
Accurate?
Maximum substrate thickness
5 mm[4]
Accurate?

Gas & chemistry3

Equipment type
Resist coater/developer[2]
Accurate?
Product description
200mm automated coater & developer[3]
Accurate?
Coating/development modes
Automated photoresist coating and developing[4]
Accurate?

Optics & imaging1

Photomask sizes supported
125 mm x 125 mm; 150 mm x 150 mm[4]
Accurate?

Configuration & options4

Process capabilities
Spin coating and spray coating[4]
Accurate?
Hotplate baking temperature
Up to 250 °C[4]
Accurate?
Edge-bead removal
Automated edge-bead removal with backside rinse[4]
Accurate?
Supported small pieces
Yes[4]
Accurate?

Vintage & configurations

  1. 2016Reference use in 2016[1]

    Four ACS200 Gen3 automatic coater/developer machines are stated as installed in Russia in 2016.

Documented models & variants

DesignationGenerationVintageChangesSource
ACS200 Gen3——Described as a 200mm automated coater & developer for 100 mm to 200 mm wafers.suss.com[3]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Equipment typeResist coater/developer[2]
  • Product description200mm automated coater & developer[3]
  • Coating/development modesAutomated photoresist coating and developing[4]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What kind of equipment is the SUSS ACS 200 Linear Wafer Tracks?

It is a wafer-track system used as a resist coater and developer.[2]

Not publicly documented

The following facts about the ACS 200 Linear Wafer Tracks are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • The control-system platform and OS era of the ACS 200 Linear Wafer Tracks are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the ACS 200 Linear Wafer Tracks are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the ACS 200 Linear Wafer Tracks is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the ACS 200 Linear Wafer Tracks are on record.

    Answerable by: an OEM parts catalog or a service engineer

  • No publicly hosted manuals, SOPs, or datasheets for the ACS 200 Linear Wafer Tracks are on record.

    Answerable by: university cleanroom staff or an OEM application specialist

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Sources & citations

Sources (6)Every fact above is drawn from these public sources
  1. [1]doi.org — doi.orgdoi.org
  2. [2]Equipment inventory listing
  3. [3]suss.com — suss.comsuss.com
  4. [4]nist.gov — nist.govnist.gov
  5. [5]ACS 200 Linear Wafer Tracks — SUSS MicroTec | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
  6. [6]https://www.epfl.ch/research/facilities/cmi/wp-content/uploads/2025/04/ACS200_manual_2025.pdf — epfl.chepfl.ch
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Last updated Oct 5, 2026.

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