SUSS MicroTec
MA 14 Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The SUSS MA 14 Mask Aligner is a mask aligner used in lithography for semiconductor and MEMS manufacturing. The SUSS MA 14 uses a 350W mercury lamp as its exposure source. The SUSS MA 14 can handle wafers up to 4 inches and masks up to 5 inches, and supports proximity, soft contact, hard contact, and vacuum contact exposure modes.[1]
How it works
The MA 14 uses a 350W mercury lamp as its exposure light source, providing multiple wavelengths. The alignment microscope is equipped with 5x and 10x objectives and supports topside alignment. The system can operate in proximity, soft contact, hard contact, and vacuum contact exposure modes. The wafer stage includes X, Y, and θ fine-adjusters for precise positioning. A wedge error compensation system is integrated to maintain exposure uniformity.[1]
What do the numbers mean?
Vacuum & pumping1
Wafer handling1
Optics & imaging3
Performance1
Configuration & options2
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Exposure modesProximity, soft contact, hard contact, vacuum contact[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the maximum wafer size the MA 14 can handle?
Up to 4 inches.[1]
What is the maximum mask size compatible with the MA 14?
Up to 5 inches.[1]
What type of exposure light source does the MA 14 use?
A 350W mercury lamp.[1]
What exposure modes does the MA 14 support?
Proximity, soft contact, hard contact, and vacuum contact.[1]
What objectives are available on the MA 14 alignment microscope?
5x and 10x objectives.[1]
Not publicly documented
The following facts about the MA 14 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 14 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 14 Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 14 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 14 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA 14 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]his-tek.com — his-tek.comhis-tek.com
- [2]Equipment inventory listing
Last updated Sep 27, 2026.
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