SUSS MicroTec
MA 200 Mask
The SUSS MA 200 is a semi-automatic mask aligner used for photolithography processes. The MA 200 uses UV400/cont/W-200 optics and a 365/405 nm dual-range sensor. The MA 200 supports wafer sizes of 6 inches and 8 inches.[1][2]
How it works
The MA 200 is equipped with a CIC1000 lamp housing for exposure illumination. The MA 200 uses UV400/cont/W-200 optics with a 365/405 dual range sensor. The MA 200 includes an AL3000 Auto Align system for mask-to-wafer alignment. The MA 200 incorporates a DVM8 vision system with Sony cameras and L25X objectives. The MA 200 includes a mask holder with guard and field expanders.[1]
What do the numbers mean?
Wafer handling3
Optics & imaging8
Performance1
Control & software1
Configuration & options12
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Canon FPA 3000 i 5 + Fine Pattern— Same function class: Lithography, nullCompare in depthsource[3]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the MA 200 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 200 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 200 Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 200 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 200 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA 200 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Equipment inventory listing
- [4]Equipment inventory listing
- [5]Equipment inventory listing
Last updated Sep 27, 2026.
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Canon FPA 3000 i 5 + Fine Pattern is a lithography aligner described with a 6-inch wafer size.
Brooks 017-0146-01 is a prealigner manufactured by Brooks.