Temescal
The Temescal VES-2550 is an e-beam evaporator and one of the Temescal standard deposition systems. The VES-2550 is designed to provide high throughput without a load lock and is suitable for all evaporation applications. The VES-2550 has a 25.5-inch (648mm) diameter, low-profile chamber.[1]
Plate 01Temescal VES-2550 Thin Film E-Beam Evaporator
The Temescal VES-2550 accommodates multiple electron beam sources in a low-profile chamber.[1]
A deposition system sits in the thin-film formation stage of semiconductor processing, after substrate preparation and before later patterning or integration steps.
Process applications and technology nodes documented for this tool.
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The following facts about the VES-2550 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the VES-2550 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the VES-2550 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the VES-2550 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the VES-2550 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the VES-2550 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 11, 2026.
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