Tokyo Electron
Alpha 303 i LPCVD
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The Tokyo Electron Alpha 303 i is a Low Pressure Chemical Vapor Deposition (LPCVD) system used in semiconductor manufacturing. LPCVD systems deposit thin films onto silicon wafers through chemical reactions at reduced pressure. The Alpha 303 i handles 12-inch (300 mm) wafers. The system is manufactured by Tokyo Electron, a major supplier of semiconductor fabrication equipment.[1][2][3]
What do the numbers mean?
Vacuum & pumping1
Wafer handling1
Configuration & options1
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Process TypeLow Pressure Chemical Vapor Deposition (LPCVD)[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
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Frequently asked questions
Not publicly documented
The following facts about the Alpha 303 i LPCVD are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alpha 303 i LPCVD are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Alpha 303 i LPCVD are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Alpha 303 i LPCVD are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Alpha 303 i LPCVD are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Alpha 303 i LPCVD is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]Equipment inventory listing
- [3]Alpha 303 i LPCVD — Tokyo Electron | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 1, 2026.
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