Waferpedia

Tokyo Electron

Mark VIII

Resist ProcessingTokyo Electron Mark family
Research Quality: 30% complete
LinkedIn X Email

The Tokyo Electron Mark VIII is a photoresist developer system used in semiconductor manufacturing. Some configurations of the Mark VIII combine developer cups with a coat cup and multiple hot plates and chill plates.[1][2][3][4][5]

Tokyo Electron logo
Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

What is it?

Applications

The Mark VIII appears in configurations using develop cups, a coat cup, hot plates, chill plates, and chemistry such as TMAH, NMP, and CRC8100.[1][2][3][4][5]

What do the numbers mean?

Gas & chemistry19

Gas
Polyimide[1]
Accurate?
Gas
CRC8100, NMP, TMAH[2]
Accurate?
Gas
TMAH[3]
Accurate?
Gas
DUV42P, PGMEA, EX4, DUV30J[7]
Accurate?
Gas
PGMEA, AR80, AR5200, IP3100[8]
Accurate?
Gas
PGMEA, PEX3 D20[9]
Accurate?
Equipment type
Developer[1]
Accurate?
2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE - Main Frame: Single Block - Gas: Polyimide - OS: DOS 1996 Vintage[1]
Accurate?
2 develop cups, 1 coat cup, 4 chill hot plates, 3 chill plates, 3 low temp hot plates, WEE Right - 1C, 2D, 1WEE, 3HP, 4 CHP, 3 COL - Main Frame: Dual Block - Gas: CRC8100, NMP, TMAH - OS: Lynx 1998 Vintage[4]
Accurate?
2 develop cups, 2 chill plates, 4 chill hot plates, 4 low temp hot plates, WEE Right - 2D, 1WEE, 3HP, 4CHP, 3COL - Main Frame: Dual Block - Gas: TMAH - OS: DOS 1998 Vintage[3]
Accurate?
2 develop cups, 9 Low temp Hot plates, 3 chill plates, WEE Right - 2D, 1WEE, 9HP, 3COL - Main Frame: Dual Block - Gas: TMAH - OS: DOS 1998 Vintage[5]
Accurate?
Type
Developer[1]
Accurate?
Process Gases
Polyimide[1]
Accurate?
Process Gases
CRC8100, NMP, TMAH[2]
Accurate?
Process Gases
TMAH[3]
Accurate?
Process configuration
2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE - Main Frame: Single Block - Gas: Polyimide - OS: DOS[1]
Accurate?
Process configuration
2 develop cups, 1 coat cup, 4 chill hot plates, 3 chill plates, 3 low temp hot plates, WEE Right - 1C, 2D, 1WEE, 3HP, 4 CHP, 3 COL - Main Frame: Dual Block - Gas: CRC8100, NMP, TMAH - OS: Lynx[4]
Accurate?
Process configuration
2 develop cups, 2 chill plates, 4 chill hot plates, 4 low temp hot plates, WEE Right - 2D, 1WEE, 3HP, 4CHP, 3COL - Main Frame: Dual Block - Gas: TMAH - OS: DOS[3]
Accurate?
Process configuration
2 develop cups, 9 Low temp Hot plates, 3 chill plates, WEE Right - 2D, 1WEE, 9HP, 3COL - Main Frame: Dual Block - Gas: TMAH - OS: DOS[5]
Accurate?

Control & software9

Operating System
DOS 1996 Vintage[1]
Accurate?
Operating System
Lynx 1998 Vintage[4]
Accurate?
Operating System
DOS 1998 Vintage[5]
Accurate?
Operating System
DOS[5]
Accurate?
Operating System
Lynx[2]
Accurate?
Control software
DOS[1]
Accurate?
Control software
Lynx[2]
Accurate?
Control system / OS
DOS[1]
Accurate?
Control system / OS
Lynx[2]
Accurate?

Configuration & options50

2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE - Main Frame: Single Block[1]
Accurate?
OS
DOS[1]
Accurate?
2 develop cups, 1 coat cup, 4 chill hot plates, 3 chill plates, 3 low temp hot plates, WEE Right[2]
Accurate?
1C, 2D, 1WEE, 3HP, 4 CHP, 3 COL - Main Frame: Dual Block[2]
Accurate?
OS
Lynx[2]
Accurate?
2 develop cups, 2 chill plates, 4 chill hot plates, 4 low temp hot plates, WEE[3]
Accurate?
Right[3]
Accurate?
2D, 1WEE, 3HP, 4CHP, 3COL - Main Frame
Dual Block[3]
Accurate?
2 develop cups, 9 Low temp Hot plates, 3 chill plates, WEE[5]
Accurate?
2D, 1WEE, 9HP, 3COL - Main Frame
Dual Block[5]
Accurate?
2 coat cups, 1 adhesion hot plates, 2 DHP, 6 Low temp hot plate, 3 chill plates[6]
Accurate?
Left[6]
Accurate?
2C, 1AD, 2DHP, 6HP, 3COL - Main Frame: Single Block - LD: 3ea, modified to Fortrend[6]
Accurate?
2 coat cups, 2 adhesion Hot plates, 6 low temp hot plates, 3 chill plates[7]
Accurate?
2C, 2AD, 6HP, 3 COL - Main Frame: Single Block - LD: 3ea, modified to Fortrend[7]
Accurate?
2 coat cups, 2 adhesion Hot plates, 6 low temp hot plates, 3 chill plates Right[8]
Accurate?
3 develop, 2 coat cups - 2C, 2D, 1 WEE, 1AD, 2DHP, 6HP, 4 COL, 1 EXT - Main Frame: Dual Block[9]
Accurate?
2 develop, WEE, 2 low temp hot plate, 1 chill plate Left[10]
Accurate?
Low temp hot plate[11]
Accurate?
2 develop cups, 1 coat cup, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE[1]
Accurate?
Main Frame
Single Block[1]
Accurate?
Main Frame
Dual Block[5]
Accurate?
2 develop cups, 2 chill plates, 4 chill hot plates, 4 low temp hot plates, WEE Right[3]
Accurate?
2 develop cups, 9 Low temp Hot plates, 3 chill plates, WEE Right[5]
Accurate?
Vintage
1996[1]
Accurate?
Vintage
1998[2]
Accurate?
Make
Tel[1]
Accurate?
Model
Mark VIII[1]
Accurate?
Develop cups
2[2]
Accurate?
Coat cup
1[1]
Accurate?
Hot plates
3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate[1]
Accurate?
Chill plates
4 chill plates[2]
Accurate?
Vintage
1996 Vintage[1]
Accurate?
Vintage
1998 Vintage[5]
Accurate?
OEM
Tokyo Electron[1]
Accurate?
Coat Cups
1[1]
Accurate?
Chill Hot Plates
3[1]
Accurate?
Chill Hot Plates
4[2]
Accurate?
Low Temp Hot Plates
4[1]
Accurate?
Low Temp Hot Plates
9[5]
Accurate?
High Temp Hot Plates
1[1]
Accurate?
Chill Plates
3[2]
Accurate?
Chill Plates
2[3]
Accurate?
Vintage Year
1996[1]
Accurate?
Vintage Year
1998[2]
Accurate?
WEE
Right[2]
Accurate?
Low temp hot plates
3[2]
Accurate?
High temp hot plate
1[1]
Accurate?
WEE
present[1]
Accurate?
WEE Right
present[2]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
Tel Mark VIII Developer—19982 develop cups, 2 chill plates, 4 chill hot plates, 4 low temp hot plates, WEE Right; main frame: Dual Block; gas: TMAH; OS: DOSEquipment inventory listing[3]
Interested in this tool?
Need help with this tool?Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • GasPolyimide[1]
  • GasCRC8100, NMP, TMAH[2]
  • GasTMAH[3]
  • GasDUV42P, PGMEA, EX4, DUV30J[7]
  • GasPGMEA, AR80, AR5200, IP3100[8]
  • GasPGMEA, PEX3 D20[9]
  • Equipment typeDeveloper[1]
  • Configuration2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE - Main Frame: Single Block - Gas: Polyimide - OS: DOS 1996 Vintage[1]
  • Configuration2 develop cups, 1 coat cup, 4 chill hot plates, 3 chill plates, 3 low temp hot plates, WEE Right - 1C, 2D, 1WEE, 3HP, 4 CHP, 3 COL - Main Frame: Dual Block - Gas: CRC8100, NMP, TMAH - OS: Lynx 1998 Vintage[4]
  • Configuration2 develop cups, 2 chill plates, 4 chill hot plates, 4 low temp hot plates, WEE Right - 2D, 1WEE, 3HP, 4CHP, 3COL - Main Frame: Dual Block - Gas: TMAH - OS: DOS 1998 Vintage[3]
  • Configuration2 develop cups, 9 Low temp Hot plates, 3 chill plates, WEE Right - 2D, 1WEE, 9HP, 3COL - Main Frame: Dual Block - Gas: TMAH - OS: DOS 1998 Vintage[5]
  • TypeDeveloper[1]
  • Process GasesPolyimide[1]
  • Process GasesCRC8100, NMP, TMAH[2]
  • Process GasesTMAH[3]
  • Process configuration2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE - Main Frame: Single Block - Gas: Polyimide - OS: DOS[1]
  • Process configuration2 develop cups, 1 coat cup, 4 chill hot plates, 3 chill plates, 3 low temp hot plates, WEE Right - 1C, 2D, 1WEE, 3HP, 4 CHP, 3 COL - Main Frame: Dual Block - Gas: CRC8100, NMP, TMAH - OS: Lynx[4]
  • Process configuration2 develop cups, 2 chill plates, 4 chill hot plates, 4 low temp hot plates, WEE Right - 2D, 1WEE, 3HP, 4CHP, 3COL - Main Frame: Dual Block - Gas: TMAH - OS: DOS[3]
  • Process configuration2 develop cups, 9 Low temp Hot plates, 3 chill plates, WEE Right - 2D, 1WEE, 9HP, 3COL - Main Frame: Dual Block - Gas: TMAH - OS: DOS[5]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

What process gases or chemistries does the Mark VIII support?

The system supports TMAH, CRC8100, NMP, and polyimide as process gases or developer chemistries.[1][2][3][4][5]

What main frame configurations are available for the Mark VIII?

The main frame can be either Single Block or Dual Block.[1][2][3][4][5]

Not publicly documented

The following facts about the Mark VIII are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Mark VIII are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the Mark VIII are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Mark VIII are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Mark VIII is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Mark VIII are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (11)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]Equipment inventory listing
  5. [5]inventory listing
  6. [6]inventory listing
  7. [7]inventory listing
  8. [8]inventory listing
  9. [9]inventory listing
  10. [10]inventory listing
  11. [11]inventory listing
Was this page accurate?

Last updated Oct 5, 2026.

Compare with similar tools

View all →
1 EC 101 R 485 Photoresist SpinnerHeadway

Headway 1 EC 101 R 485 is a photoresist spinner with stated vacuum and electrical requirements.

CategoryResist Processing
4 specs
Mark VIII vs 1 EC 101 R 485 Photoresist Spinner →
100 SpinCEE

The CEE 100 is a spin coater with a listed power specification of 115 volts and 800 watts.

CategoryResist Processing
2 specs
Mark VIII vs 100 Spin →
120 Automated Coater ProcessingEV Group

The EV Group 120 Automated Coater Processing System is an automated coater for 6-inch and 8-inch wafers, built in 2015 and requiring 50/60 Hz, 3-phase, 4-wire plus ground power.

CategoryResist Processing
7 specs
Mark VIII vs 120 Automated Coater Processing →
200 PCU Photoresist StabilizerAxcelis
CategoryResist Processing
6 specs
Mark VIII vs 200 PCU Photoresist Stabilizer →
211TEGAL

The TEGAL 211 is a table top plasma etcher/asher for up to 3-inch wafers with an aluminum chamber.

CategoryResist Processing
13 specs
Mark VIII vs 211 →
300 X SpinBrewer Science

The Brewer Science 300 X Spin Coater is a spin coater with a heavy duty drive and 208-240 V operation.

CategoryResist Processing
6 specs
Mark VIII vs 300 X Spin →