Varian
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The Varian E 500 EHPI is a medium current ion implanter used for doping semiconductor wafers. The Varian E 500 EHPI processes 200 mm (8 inch) wafers.[1]
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The following facts about the E 500 EHPI Medium Current are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the E 500 EHPI Medium Current are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the E 500 EHPI Medium Current are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the E 500 EHPI Medium Current are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the E 500 EHPI Medium Current are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the E 500 EHPI Medium Current is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 1, 2026.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.