3305

Wet processing and clean equipment is used in semiconductor manufacturing for cleaning, stripping, and etching of wafers. The Veeco 3305 is a wet processing and clean system. The Veeco 3305 is a single-wafer immersion tool. The Veeco 3305 operates with dry-in/dry-out processing. The Veeco 3305 requires 415 Vac, 3 phase, 50 Hz, and 30 Amp electrical supply. The Veeco 3305 is part of the Veeco 33xx family.^[1][2]

Immersion wet processing tools expose wafers to chemical solutions in a process chamber. Wafers are loaded into the chamber and immersed in the chemistry. After the chemical step, wafers are rinsed with deionized water and then dried. Single-wafer immersion tools often use a spin chuck to rotate the wafer during chemical dispensing and drying. The dry-in/dry-out designation means the wafer enters the chamber dry and exits dry after completion of the rinse and dry cycles.

Wet cleaning and processing steps are inserted at multiple points in semiconductor fabrication. Typical applications include pre-diffusion cleaning, post-etch residue removal, and photoresist stripping. The Veeco 3305 would be placed after deposition or etching steps to clean the wafer surface. Upstream processes include chemical vapor deposition or dry etching. Downstream steps may involve inspection, metrology, or further deposition and patterning.

Wet processing systems are used for removing photoresist residues, particles, and native oxides from wafer surfaces. The Veeco 3305 can be employed for cleaning wafers prior to critical process steps. Such tools may also be configured for wet etching of thin films or for lift-off processes. The single-wafer immersion configuration allows precise control over each wafer's process.