YES
G1000
The YES G1000 Plasma Cleaning System generates plasma at 40 kHz for cleaning and descum of substrates. The YES G1000 Plasma Cleaning System features a unique downstream mode that leaves electronic properties unchanged.[1]
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What it is
The YES G1000 is a plasma cleaning system. The system is used for substrate cleaning, low temperature descum, surface modification and gentle cleaning of inorganic substrates. The YES G1000 uses a plasma generation frequency of 40 kHz. The chamber is made of 1/2 inch 6061-T6 aluminum. The system has four powered shelves for increased capacity over the YES 500 model. The process area per tray is 15.13 inches wide by 15.39 inches deep. The YES G1000 offers five plasma modes: Electron free / Downstream mode, Active mode, RIE mode, Active Ion trap, and Downstream Ion trap.[1]
Where it fits in the process flow
General reference — not yet source-verifiedPlasma cleaning is performed before thin film deposition to remove organic residues and improve adhesion. The process is also used after photolithography to remove residual photoresist in a descum step. Surface modification prior to bonding is another common application.
Applications
The YES G1000 is used for substrate cleaning. The system performs substrate descum. Surface modification of inorganic substrates is an application. Gentle cleaning of inorganic substrates is another application. The system is suitable for cleaning electronically sensitive devices.[1]
- Substrate cleaning
- Substrate descum
- Surface modification of inorganic substrates
- Gentle cleaning of inorganic substrates
- Cleaning of electronically sensitive devices
- Etching
- Surface modification prior to bonding
What do the numbers mean?
Power & electrical1
Control & software3
Configuration & options11
What replaced it?
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Plasma frequency40 kHz[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What materials are used for the chamber?
The chamber is made of 1/2 inch 6061-T6 aluminum.[1]
What is the plasma generation frequency?
The plasma generation frequency is 40 kHz.[1]
How many powered shelves does the system have?
The system has four powered shelves.[1]
What are the available plasma modes?
The five plasma modes are: Electron free / Downstream mode, Active mode, RIE mode, Active Ion trap, and Downstream Ion trap.[1]
What are the primary applications of the system?
The system is used for substrate cleaning, substrate descum, surface modification of inorganic substrates, gentle cleaning of inorganic substrates, and cleaning of electronically sensitive devices.[1]
Not publicly documented
The following facts about the G1000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the G1000 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the G1000 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the G1000 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the G1000 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the G1000 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]pnf.uchicago.edu — pnf.uchicago.edupnf.uchicago.edu
- [2]web.archive.orgweb.archive.org
- [3]Yield Engineering Systems, Inc. > Products > Plasma Cleaning Systems > G Series — yieldengineering.com (Mar 29, 2012)web.archive.org
Last updated Sep 21, 2026.
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