Comparison ledger
ABM -407B-1-S-CES293 Robot, Hitachi U 3900, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | U 3900Hitachi | |
|---|---|---|
| OEM | ABM | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM -407B-1-S-CES293 Robot | Hitachi U 3900 |
| Cited variants | — |
|
| Specifications | ||
| Model | ABM-407B-1-S-CES293[2] | — |
| Description | ROBOT[2] | — |
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[2] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[2] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[2] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[2] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[2] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[2] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[2] | — |
| P/N | — | 2J2-0012[3] |
| Type | — | Double-beam, single-monochromator UV-visible spectrophotometer[1] |
| Wavelength range | — | 190 to 900 nm[1] |
| Band pass | — | Variable 0.1, 0.5, 1, 2, 4, and 5 nm[1] |
| Scan speed | — | 1.5, 3, 15, 30, 60, 120, 300, 600, 1200, 1800, 2400 nm/min[1] |
| Detector | — | Single photomultiplier[1] |
| Dimensions | — | 680 (W) x 692 (D) x 257 (H) mm; 27 in (W) x 27 in (D) x 10 in (H)[1] |
| Weight | — | Approx. 45 kg (100 lbs)[1] |
| Power requirements | — | 100, 120, 220, 230 or 240 V AC, 50/60 Hz, 300 VA[1] |
| Vintage | — | 2009[3] |