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Comparison ledger

0010-03485 Magnet Assyversus2100CD

Applied Materials 0010-03485 Magnet Assy, Varian 2100CD, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
2100CDVarian
OEMApplied MaterialsVarian
Category——
Wafer size——
Process node——
Introduced——
Production run—1987–2007
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyVarian 2100CD
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Power Source—Klystron[5]
Electron Energies—Yes[5]
Max Dose Rate Electrons—1000 MU/min[5]
Default photon dose rate—600 MU/min[5]
Multi-Leaf Collimator (MLC) options—80 (Field size 40x40cm); 120 MLC (Field size 40x40cm, Central 20cm of field - 5mm leaf width, Outer 20cm of field - 10mm leaf width)[5]
Portal Imager (EPID) options—LC250, aS500, aS1000 (optional)[5]
Cone-Beam CT—Only with OBI[5]
VMAT—Only with OBI[5]
Stereotactic Radiosurgery—Optional Cones or mMLC[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]oncologysystems.comoncologysystems.com